Light-Written Reversible 3D Fluorescence and Topography Dual-Pattern with Memory and Self-Healing Abilities
Optical microscope images of the patterns direct-written using a series of positive concentric circular annulus photomasks with different sizes: (a) 30 μm; (b) 60 μm; (c) 100 μm; (d) 200 μm; (e) 300 μm; (f) 500 μm. The thickness of polymer blend film is fixed at approximately 200 μm. The intensity and exposure time of 365 nm UV light are approximately 50 mW/cm2 and 30 seconds, respectively.
Please note that the Table of Contents page is currently not displaying content published since June 7, 2021. We are working to fix this issue as soon as possible and apologize for the inconvenience.