Light-Written Reversible 3D Fluorescence and Topography Dual-Pattern with Memory and Self-Healing Abilities
The evolution of the direct-written pattern from positive concentric square photomasks (size width/space: 50/50 μm) with different exposure time observed with LSCM images: (a) 10 S; (b) 60 S; (c) 120 S. (d) The statistical height () of the patterns dependent on the exposure time. The thickness of the polymer blend film was ≈200 μm. The intensity of 365 nm UV light is approximately 50 mW/cm2.
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