The reversibility, memory behavior, and healing ability of the dual-pattern. (a) The LSCM and fluorescence images showing the cyclic erasable process: writing the patterns, erasing the patterns, and rewriting the patterns: (a, I) topography and fluorescence image of the original sample; (a, II) topography and fluorescence image of the written sample with the patterns of concentric squares (size width/space: 50/50 μm); (a, III) the topography of the written sample without the mask during the exposure; (a, IV) 3D topography and fluorescence of the written sample with the patterns of “SJTU.” The thickness of the polymer blend film was ≈200 μm. The intensity and exposure time of 365 nm UV light were ≈50 mW/cm2 and 30 seconds, respectively. (b) LSCM images showing the shape memory process of the 3D well-ordered pattern: (b, I) the original shape of the pattern (concentric squares, size width/space: 50/50 μm); (b, II) temporary state of the pattern; (b, III) the recovery shape of the pattern after heated at about 60°C for 3 minutes. (c) Optical images showing the self-healing process of the 3D pattern: (c, I) the damaged sample (concentric circular annulus (size width/space: 100/100 μm)) with a crack; (c, II) the healed sample after heated at about 80°C for 5 minutes.