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Research Article

Wafer-Scale Synthesis of WS2 Films with In Situ Controllable p-Type Doping by Atomic Layer Deposition

Table 1

Benchmark of p-type WS2 transistors.

ReferenceMethod of p-type dopingGrowth methodControllable dopingWafer scale synthesisEOT (nm)Ion/Ioff at 4.6 MV/cm

Our workNbALD13101
[20]NbCVD××270<10
[36]NbCVD××285102
[39]ΦmALD×15102
[27]ΦmALD×60104
[28]ΦmCVD××5.16106
[23]CHPECVD××32.5104

stands for adjusting metal work function (Ti et al.).