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Research Article

Precision Phenotyping Reveals Novel Loci for Quantitative Resistance to Septoria Tritici Blotch

Steven Yates1, Alexey Mikaberidze2, Simon G. Krattinger3, Michael Abrouk3, Andreas Hund4, Kang Yu4, Bruno Studer1, Simone Fouche2, Lukas Meile2, Danilo Pereira2, Petteri Karisto2, and Bruce A. McDonald2

1Molecular Plant Breeding, Institute of Agricultural Sciences, ETH Zurich, Zurich, Switzerland
2Plant Pathology, Institute of Integrative Biology, ETH Zurich, Zurich, Switzerland
3Biological and Environmental Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, Saudi Arabia
4Crop Science, Institute of Agricultural Sciences, ETH Zurich, Zurich, Switzerland
Correspondence should be addressed to Bruce A. McDonald; bruce.mcdonald@usys.ethz.ch

How to Cite this Article

Steven Yates, Alexey Mikaberidze, Simon G. Krattinger, et al., “Precision Phenotyping Reveals Novel Loci for Quantitative Resistance to Septoria Tritici Blotch,” Plant Phenomics, vol. 2019, Article ID 3285904, 11 pages, 2019. https://doi.org/10.34133/2019/3285904.

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